femtosecond laser etching
femtosecond lasers are ultrashort pulsed lasers (1 fs = 10? & sup1; sec) with extremely high peak power and energy density.

They can directly ionize the material without remelting the layer, minimizing the thermal impact of the etching process and achieving ultra-high process quality.

Key functions of surface structure
• Reduced friction/oil retention
• Diffractive structures in optical applications
• Micro-mold processing (light guide plate, injection mold, pad printing plate, etc.)
• Customized surface roughness
• Hydrophobic/hydrophilic properties
• Precise marking

Advantages of Femtosecond Laser Etching

• High accuracy and consistency: handle tiny features, only 10 microns or less, depth error control in the micron level
• Excellent sidewall verticality: Optimized energy distribution and scan path maintain minimal taper even at 1:1 aspect ratio
• Flat Bottom Quality: Advanced scanning strategy ensures uniform energy and avoids bottom irregularities
• Fine surface: no potholes or burrs, Ra≤ 0.2 microns, ensuring structural integrity and strength
• Highly controllable: precise control of microstructure geometry and arrangement